Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
UNEDA Michio and TAKAHASHI Yoshihiro and SHIBUYA Kazutaka and NAKAMURA Yoshio and ICHIKAWA Daizo and ISHIKAWA Ken-ichi,Influence analysis of removal rate in Si-chemical mechanical planarization/ polishing,Journal of the Japan Society for Abrasive Technology,09142703,The Japan Society for Abrasive Technology,2014,58,10,652-657,https://cir.nii.ac.jp/crid/1390001204334299776,https://doi.org/10.11420/jsat.58.652