(Ba<sub>x</sub>, Sr<sub>1-x</sub>) TiO<sub>3</sub> Films for Gbit Scale DRAMs
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- Yuuki Akimasa
- Mitsubishi Electric Corp
Bibliographic Information
- Other Title
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- DRAM用高誘電率薄膜キャパシタの形成技術
- DRAMヨウ コウ ユウデンリツ ハクマク キャパシタ ノ ケイセイ ギジュツ
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Journal
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- IEEJ Transactions on Electronics, Information and Systems
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IEEJ Transactions on Electronics, Information and Systems 117 (3), 217-219, 1997
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204607774336
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- NII Article ID
- 130006843658
- 10002809524
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- NII Book ID
- AN10065950
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- ISSN
- 13488155
- 03854221
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- NDL BIB ID
- 4149757
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles