著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
KIM Hyo June and CHA Seung Yong and CHOI Doo Jin,Electrical properties of Al2O3/La2O3/Al2O3 films using various tunnel oxide thicknesses for non-volatile memory device applications,Journal of the Ceramic Society of Japan,18820743,公益社団法人 日本セラミックス協会,2009,117,1365,555-557,https://cir.nii.ac.jp/crid/1390001205283498624,https://doi.org/10.2109/jcersj2.117.555