Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
SAKAI Itsuko and SAKURAI Noriko and OHIWA Tokuhisa,High Rate Deep Si Etching using Capacitively Coupled Plasma,Journal of the Vacuum Society of Japan,18822398,The Vacuum Society of Japan,2010,53,7,429-434,https://cir.nii.ac.jp/crid/1390001205295764736,https://doi.org/10.3131/jvsj2.53.429