Measurement of Light Emission from High Density Plasma Produced by Pulse Laser for Extreme-ultraviolet (EUV) Source

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Other Title
  • EUV光源開発のためのパルスレーザによる高密度プラズマ生成と発光計測

Description

We investigated the light emission from high density plasma produced by pulse laser, which is essential to extreme–ultraviolet (EUV) source for the next generation lithography. We measured EUV intensity and visible light emission from the plasma generated by focused laser to targets of three metals (Sn, Al, Cu) and two target shapes (flat, cone), using a photo diode senser with Si/Zr filter and a high–speed framing camera. The EUV emission from Sn target was highest. The duration of visible light emission from the cone shaped target was longer than that for flat target. These results suggest that the cone shaped Sn target is promising for the high power EUV light source application.

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Details 詳細情報について

  • CRID
    1390001205648494208
  • NII Article ID
    130004656964
  • DOI
    10.11522/pscjspe.2005a.0.425.0
  • Article Type
    journal article
  • Data Source
    • JaLC
    • CiNii Articles
    • KAKEN
  • Abstract License Flag
    Disallowed

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