Development of High Performance EUV Light Source by Laser Produced Plasma

DOI
  • Nakano Motohiro
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University
  • Yoshikawa Takaya
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University
  • Otani Yuko
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University
  • Kataoka Toshihiko
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University
  • Inoue Haruyuki
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University
  • Oshikane Yasushi
    Dept. of Prec. Sci. & Technol. and Appl. Phys., Grad. School of Eng., Osaka University

Bibliographic Information

Other Title
  • 高性能レーザプラズマEUV(Extreme-ultraviolet）光源の開発
  • ターゲット構造とEUV変換効率の評価

Description

To create a future system of extreme-ultraviolet (EUV) lithography, an innovative light source with 13.5nm wavelength is demanded very high power and long operation life at high repetition rate. Tin target has significant potential for high conversion efficiency (CE). We have proposed a new method to develop high performance EUV light source by using the tin target with cone shape. We investigate the EUV emission from high density plasma produced by focused laser to Sn targets, using a photo diode sensor with Mo/Si filter. We measure the angular distribution of EUV emission and evaluate the CE for our proposed tin targets with conical hole.

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Details 詳細情報について

  • CRID
    1390001205651897344
  • NII Article ID
    130004658236
  • DOI
    10.11522/pscjspe.2006a.0.585.0
  • Article Type
    journal article
  • Data Source
    • JaLC
    • CiNii Articles
    • KAKEN
  • Abstract License Flag
    Disallowed

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