Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Wu Yongbo and Kato Masana and Yang Weiping and Sato Toshikatsu and Kobayashi Naoki,Fundamental study on the treatment of silicon wafer edge by ultrasonically assisted polishing,Proceedings of JSPE Semestrial Meeting,,The Japan Society for Precision Engineering,2006,2006A,0,421-422,https://cir.nii.ac.jp/crid/1390001205652211072,https://doi.org/10.11522/pscjspe.2006a.0.421.0