Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Matsunaga Takahiro and Uneda Michio and Shibuya Kazutaka and Nakamura Yoshio and Ichikawa Daizo and Ishikawa Ken-ichi,Determination of polishing pad conditioning method based on relationship between polishing apparatus and various consumables at chemical mechanical polishing,Proceedings of JSPE Semestrial Meeting,,The Japan Society for Precision Engineering,2017,2017S,0,531-532,https://cir.nii.ac.jp/crid/1390001205659523712,https://doi.org/10.11522/pscjspe.2017s.0_531