著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Siozawa Ken–itiro and Tabaru Kenji and Maruyama Takahiro and Fujiwara Nobuo and Yoneda Masahiro,SiO<sub>2</sub> Etching in C<sub>4</sub>F<sub>8</sub>/O<sub>2</sub> Electron Cyclotron Resonance Plasma,Japanese Journal of Applied Physics,0021-4922,The Japan Society of Applied Physics,1996,35,4B,2483-2487,https://cir.nii.ac.jp/crid/1390001206246969088,https://doi.org/10.1143/jjap.35.2483