Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Tung Raymond T.,A Novel Technique for Ultrathin CoSi2 Layers: Oxide Mediated Epitaxy.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1997,36,3B,1650-1654,https://cir.nii.ac.jp/crid/1390001206247663872,https://doi.org/10.1143/jjap.36.1650