Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Arita Yoshinobu and Kuranari Kunihiro,Characteristics of the Electric Capacitance and Dielectric Loss of the Thermal Oxide of Porous Silicon Formed Using Highly Phosphorus Diffused Silicon.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1997,36,3A,1035-1039,https://cir.nii.ac.jp/crid/1390001206247851648,https://doi.org/10.1143/jjap.36.1035