Chemical Kinetic Modelling of Non-Equilibrium Ar-CO<sub> 2</sub> Thermal Plasmas
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- Beuthe Thomas G.
- AECL–Whiteshell Laboratories, Pinawa, Manitoba, Canada, R0E 1L0
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- Chang Jen–Shih
- Dept. Eng. Phys., McMaster Univ., Hamilton, Ontario, Canada L8S 4M1
書誌事項
- タイトル別名
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- Chemical Kinetic Modelling of Non-Equilibrium Ar-CO2 Thermal Plasmas.
- Chemical Kinetic Modelling of Non-Equil
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説明
A chemical kinetic model has been constructed to predict the gas and electron temperature dependence of the neutral and ionic species composition in Ar-CO2 mixtures under thermal plasma conditions. The model includes electron impact, thermal impact, ion-molecule, and recombination reactions as well as accounting for diffusion. Important metastable and excited states of species have been accounted for as well as the presence of neutral molecules, radicals, and atoms, positively and negatively charged atoms and molecular ions, and electrons. All relevant electron temperature, gas temperature and pressure terms have been included. Under thermodynamic non-equilibrium conditions, Ar, CO, and O were found to be the dominant neutral species, CO4+ the dominant positive ion, and O- and electrons the dominant negatively charged species.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 36 (7B), 4997-5002, 1997
The Japan Society of Applied Physics
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001206248922368
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- NII論文ID
- 30021829308
- 10004374705
- 210000041576
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4270512
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可