著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Arai Takeshi and Nakamura Takuya and Shirai Hajime,Fast Deposition of Amorphous and Microcrystalline Silicon Films from SiH<sub>2</sub>Cl<sub>2</sub>–SiH<sub>4</sub>–H<sub>2</sub> by Plasma-Enhanced Chemical Vapor Deposition,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1997,36,7B,4907-4910,https://cir.nii.ac.jp/crid/1390001206248928384,https://doi.org/10.1143/jjap.36.4907