著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Konishi Morikazu and Kubota Michitaka and Koike Kaoru,Electron Beam Induced Damage of MOS Gate Oxide.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1998,37,3B,1129-1136,https://cir.nii.ac.jp/crid/1390001206249246848,https://doi.org/10.1143/jjap.37.1129