著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Chiba Akira and Hoshino Eiichi and Takahashi Masashi and Yamanashi Hiromasa and Ogawa Taro and Okazaki Shinji,Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2001,40,11,6208-6211,https://cir.nii.ac.jp/crid/1390001206251736832,https://doi.org/10.1143/jjap.40.6208