著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nakahata Kouichi and Ro Kazuyoshi and Suemasu Atsushi and Kamiya Toshio and Fortmann Charles Michael and Shimizu Isamu,Fabrication of Polycrystalline Silicon Films from SiF<sub>4</sub>/H<sub>2</sub>/SiH<sub>4</sub> Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2000,39,6A,3294-3301,https://cir.nii.ac.jp/crid/1390001206253712896,https://doi.org/10.1143/jjap.39.3294