著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hamamura Hirotaka and Komiyama Hiroshi and Shimogaki Yukihiro,TiN Films Prepared by Flow Modulation Chemical Vapor Deposition using TiCl<sub>4</sub> and NH<sub>3</sub>,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2001,40,3A,1517-1521,https://cir.nii.ac.jp/crid/1390001206253803520,https://doi.org/10.1143/jjap.40.1517