著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kim Seong-Ho and Kim Sung-Hoan and Kim Sung-Eun and Kim Myung-Soo and Park Joo-Han and Kim Eun-Soo and Kim Jin-Tae,Process Design for Preventing the Gate Oxide Thinning in the Integration of Dual Gate Oxide Transistor.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2002,41,4B,2404-2409,https://cir.nii.ac.jp/crid/1390001206256286464,https://doi.org/10.1143/jjap.41.2404