著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hozawa Kazuyuki and Isomae Seiichi and Yugami Jiro,Copper Distribution near a SiO<sub>2</sub>/Si Interface under Low-Temperature Annealing,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2002,41,10,5887-5893,https://cir.nii.ac.jp/crid/1390001206256519424,https://doi.org/10.1143/jjap.41.5887