著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tanaka Kei and Yoshimura Masamichi and Okamoto Atsuto and Ueda Kazuyuki,Growth of Carbon Nanowalls on a SiO<sub>2</sub> Substrate by Microwave Plasma-Enhanced Chemical Vapor Deposition,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2005,44,4A,2074-2076,https://cir.nii.ac.jp/crid/1390001206264234368,https://doi.org/10.1143/jjap.44.2074