著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Lee Sungjoo and Kwong Dim-Lee,Reliability Characteristics of poly Si-gated High Quality Chemical Vapor Deposition Hafnium Oxide Gate Dielectric,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2004,43,2,427-431,https://cir.nii.ac.jp/crid/1390001206264989824,https://doi.org/10.1143/jjap.43.427