著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Arakawa Taro and Awa Yoshiki and Ide Tomoyoshi and Haneji Nobuo and Tada Kunio and Sugiyama Masakazu and Shimizu Hiromasa and Shimogaki Yukihiro and Nakano Yoshiaki,Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH<sub>4</sub>/H<sub>2</sub>/Ar and O<sub>2</sub> with Constant Ar Flow,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2005,44,7B,5819-5823,https://cir.nii.ac.jp/crid/1390001206265141888,https://doi.org/10.1143/jjap.44.5819