著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Taishi Toshinori and Huang Xinming and Kubota Masayoshi and Kajigaya Tomio and Fukami Tatsuo and Hoshikawa Keigo,Heavily Boron-Doped Silicon Single Crystal Growth: Constitutional Supercooling,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2000,39,1AB,L5-L8,https://cir.nii.ac.jp/crid/1390001206270665600,https://doi.org/10.1143/jjap.39.l5