透光性窒化ケイ素セラミックスの焼結条件と微細構造

  • 北條 純一
    九州大学大学院工学研究院応用化学部門,
  • 楊 文伍
    九州大学大学院工学府物質創造工学専攻
  • 稲田 幹
    九州大学大学院工学研究院応用化学部門,
  • 田中 優実
    九州大学大学院工学研究院応用化学部門,
  • 榎本 尚也
    九州大学大学院工学研究院応用化学部門,

書誌事項

タイトル別名
  • Sintering Condition and Microstructure of Translucent Silicon Nitride Ceramics
公開日
2014
DOI
  • 10.2497/jjspm.61.575
公開者
一般社団法人 粉体粉末冶金協会

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説明

Translucent Si3N4 ceramics are expected to use for a special optical application in high temperature and corrosive environment owing to its high mechanical strength and thermal and chemical stability. To achieve the translucency of Si3N4 ceramics, fine-grained microstructure with an appropriate sintering aid is important to reduce light scattering. The Si3N4 ceramics were fabricated by spark-plasma sintering (SPS) with AlN – MgO additive. Fine α – Si3N4 powder with high purity was useful to obtain translucent Si3N4 sintered body. When the additive content was large, α – SiAlON formed, whereas β – Si3N4 formed at a small additive content, revealing the high translucency of both phases in visible light region. The AlN/MgO ratio should be on the SiAlON forming line (AlN/MgO = 3/1) in Si3N4 – AlN – MgO phase diagram. The short-time sintering at high temperature (1850 ˚C, 5 min) by SPS was effective to obtain the dense and fine-grained microstructure, and the transmittance of 22~28 % at the wavelength of 900 nm was achieved under the optimal conditions.

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