Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI) Taguchi Osamu and Iijima Yoshiaki and Hirano Ken-ichi,Application of Atomic Absorption Analysis to Impurity Diffusion of Copper in Nickel in a Wide Range of Temperature,Journal of the Japan Institute of Metals and Materials,00214876,The Japan Institute of Metals and Materials,1984,48,1,20-24,https://cir.nii.ac.jp/crid/1390001206485270656,https://doi.org/10.2320/jinstmet1952.48.1_20