Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Inoue Shozo and Uchida Hitoshi and Ohba Takaaki and Koterazawa Keiji and Chayahara Akiyoshi and Terasawa Mititaka,Dynamic Process Control of rf Reactive Sputtering by Monitoring Plasma Emission Intensity,Journal of the Japan Institute of Metals and Materials,00214876,The Japan Institute of Metals and Materials,1997,61,10,1108-1114,https://cir.nii.ac.jp/crid/1390001206492247296,https://doi.org/10.2320/jinstmet1952.61.10_1108