著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
INAMI Takashi and TAMAHASHI Kunihiro and NAMEKAWA Takashi and CHIBA Akio and ONUKI Jin,Grain Size Distribution at the Bottom Region in Very Narrow Cu Interconnects,Electrochemistry,13443542,公益社団法人 電気化学会,2016,84,3,151-155,https://cir.nii.ac.jp/crid/1390001206499874816,https://doi.org/10.5796/electrochemistry.84.151