Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
ONO Kouichi,Numerical Simulation and Technology Computer-Aided Design of Plasma Processing for the Fabrication of Semiconductor Microelectronic Devices,Journal of Plasma and Fusion Research,09187928,The Japan Society of Plasma Science and Nuclear Fusion Research,2004,80,11,909-918,https://cir.nii.ac.jp/crid/1390001206513461504,https://doi.org/10.1585/jspf.80.909