{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1390004222610888448.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.5940/jcrsj.62.150"}},{"identifier":{"@type":"NDL_BIB_ID","@value":"030651224"}},{"identifier":{"@type":"URI","@value":"http://id.ndl.go.jp/bib/030651224"}},{"identifier":{"@type":"URI","@value":"https://ndlsearch.ndl.go.jp/books/R000000004-I030651224"}},{"identifier":{"@type":"URI","@value":"https://www.jstage.jst.go.jp/article/jcrsj/62/3/62_150/_pdf"}},{"identifier":{"@type":"NAID","@value":"130007896094"}}],"dc:title":[{"@language":"en","@value":"Analysis on the Shapes of the Shockley type Stacking Faults Generated by the REDG Effect in the 4H-SiC Power Devices"},{"@language":"ja","@value":"4H-SiC電力素子中でのREDG効果により成長したShockley型積層欠陥の形状についての解析"},{"@language":"ja-Kana","@value":"4H-SiC デンリョク ソシ チュウ デ ノ REDG コウカ ニ ヨリ セイチョウ シタ Shockleyガタ セキソウ ケッカン ノ ケイジョウ ニ ツイテ ノ カイセキ"}],"dc:language":"ja","description":[{"type":"abstract","notation":[{"@language":"en","@value":"<p>A complete set of 12 different dissociated states of basal-plane dislocation loops in 4H-SiC has been derived from experimental observations and crystallographic space group discussion. We have observed dissociated states of dislocations in 4H-SiC power devices using synchrotron X-ray Berg-Barrett topography, and analysis results are summarized. The arrangement of the results is used to discuss the shapes of Shockley-type stacking faults which were generated by recombination enhanced dislocation glide. The list of the dissociated states of basal-plane dislocation loops is useful also for the analysis of dislocation structures in hexagonal lattice.</p>"}],"abstractLicenseFlag":"disallow"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1410004222610888448","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000410037527"}],"foaf:name":[{"@language":"en","@value":"MATSUHATA Hirofumi"},{"@language":"ja","@value":"松畑 洋文"}],"jpcoar:affiliationName":[{"@language":"ja","@value":"産業技術総合研究所，先進パワーエレクトロニクス研究センター"},{"@language":"en","@value":"Advanced Industrial Science and Technology, Advanced Power Electronics Research Center"}]},{"@id":"https://cir.nii.ac.jp/crid/1410004222610888449","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000410037528"}],"foaf:name":[{"@language":"en","@value":"SEKIGUCHI Takashi"},{"@language":"ja","@value":"関口 隆史"}],"jpcoar:affiliationName":[{"@language":"ja","@value":"筑波大学大学院 数理物質科学研究科 電子・物理工学専攻"},{"@language":"en","@value":"Department of Applied Physics, Faculty of Pure and Applied Sciences, University of Tsukuba"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"03694585"},{"@type":"LISSN","@value":"03694585"},{"@type":"EISSN","@value":"18845576"},{"@type":"NDL_BIB_ID","@value":"000000018362"},{"@type":"ISSN","@value":"03694585"},{"@type":"NCID","@value":"AN00188364"}],"prism:publicationName":[{"@language":"en","@value":"Nihon Kessho Gakkaishi"},{"@language":"ja","@value":"日本結晶学会誌"},{"@language":"en","@value":"Nihon Kessho Gakkaishi"},{"@language":"en","@value":"Journal of the Crystallographic Society of Japan"},{"@language":"ja","@value":"日本結晶学会誌"}],"dc:publisher":[{"@language":"en","@value":"The Crystallographic Society of Japan"},{"@language":"ja","@value":"日本結晶学会"}],"prism:publicationDate":"2020-08-31","prism:volume":"62","prism:number":"3","prism:startingPage":"150","prism:endingPage":"157"},"reviewed":"false","dcterms:accessRights":"http://purl.org/coar/access_right/c_abf2","url":[{"@id":"http://id.ndl.go.jp/bib/030651224"},{"@id":"https://ndlsearch.ndl.go.jp/books/R000000004-I030651224"},{"@id":"https://www.jstage.jst.go.jp/article/jcrsj/62/3/62_150/_pdf"}],"availableAt":"2020-08-31","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1360003449889815552","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Material science and device physics in SiC technology for high-voltage power devices"}]},{"@id":"https://cir.nii.ac.jp/crid/1360011144289683072","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Step-controlled epitaxial growth of SiC: High quality 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