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Characteristics of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (6) - Development study of multi-element molecular ion implantation technique -
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- Hirose Ryo
- SUMCO Corp.
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- Okuyama Ryosuke
- SUMCO Corp.
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- Kadono Takeshi
- SUMCO Corp.
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- Koga Yoshihiro
- SUMCO Corp.
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- Okuda Hidehiko
- SUMCO Corp.
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- Kurita Kazunari
- SUMCO Corp.
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- Miyamoto Naoki
- NISSIN ION EQUIPMENT Corp.
Bibliographic Information
- Other Title
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- 炭素クラスターイオン注入Siエピウェーハの特徴（6） -多元素・分子イオン注入技術の開発検討-
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2016.1 (0), 3624-3624, 2016-03-03
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390013972158696192
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC