Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Fujiwara Kazuki and Teramura Mizuki and Taguch Kentaro and Taniguch Kai and Ishikawa Hiroyasu,AP-MOCVD deposition of CuO thin films,JSAP Annual Meetings Extended Abstracts,2436-7613,The Japan Society of Applied Physics,2015-08-31,2015.2,0,3564-3564,https://cir.nii.ac.jp/crid/1390014348396459904,https://doi.org/10.11470/jsapmeeting.2015.2.0_3564