Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
SUGIHARA Tatsuki and KANEKO Arata,Local dose distribution and changing resist cross-sectional shapes in electron beam lithography,Transactions of the JSME (in Japanese),2187-9761,The Japan Society of Mechanical Engineers,2024,90,930,23-00232,https://cir.nii.ac.jp/crid/1390017843853252224,https://doi.org/10.1299/transjsme.23-00232