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Effects of gas pressure and substrate position on deposition characteristics of a-C:H films deposited by plasma CVD method
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- Ono Shinjiro
- Kyushu Univ.
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- Yoshikawa Daichi
- Kyushu Univ.
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- Hwang Sung Hwa
- Kyushu Univ.
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- Okumura Takamasa
- Kyushu Univ.
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- Kamataki Kunihiro
- Kyushu Univ.
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- Yamashita Naoto
- Kyushu Univ.
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- Itagaki Naho
- Kyushu Univ.
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- Koga Kazunori
- Kyushu Univ. NINS
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- Shiratani Masaharu
- Kyushu Univ.
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- Oh Jun Seok
- Osaka City Univ.
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- Takabayashi Susumu
- Ariake College
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- Nakatani Tatsuyuki
- Okayama Univ. Sci.
Bibliographic Information
- Other Title
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- プラズマCVD法を用いたa-C:H薄膜製膜特性に対するガス圧力・基板位置の効果
- Published
- 2022-02-25
- DOI
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- 10.11470/jsapmeeting.2022.1.0_1491
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2022.1 (0), 1491-1491, 2022-02-25
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390022457811210368
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC