マルチウィンドウ型アンテナを用いた極超短波プラズマ源

中川 行人, 和仁 悦夫, 佐藤 久明, 寒川 誠二, 塚田 勉

doi:10.3131/jvsj.41.307

書誌事項

タイトル別名

Ultra High Frequency Plasma Source Using Multi-Window Type Antenna.
マルチウィンドウガタアンテナオモチイタゴクチョウタンパプラズマゲン

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説明

A new plasma source using a ultra high frequency (UHF) power radiated by a multi-window type antenna was developed. The UHF power was confined in a re-entrant type cavity resonator and radiated from 6 (six) quartz windows which were located on the bottom plate of the cavity. The production efficiency of UHF plasma was improved employing the new antenna structure. The radial non-uniformity of the ion current was less than ±5% at the plasma density of 10¹¹ cm^-3. The value is applicable for the φ300 mm wafer processing. Some preliminary results on SiO₂ etch characteristics employing the perfluorocarbon gas chemistry shows that the plasma source will be suitable for the future fine etch processes.

収録刊行物

真空

真空 41 (3), 307-310, 1998

一般社団法人日本真空学会

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詳細情報詳細情報について

CRID: 1390282679040184320

NII論文ID: 10001960037

NII書誌ID: AN00119871

DOI: 10.3131/jvsj.41.307

ISSN: 18809413; 05598516

NDL書誌ID: 4469639

Web Site: http://id.ndl.go.jp/bib/4469639; https://ndlsearch.ndl.go.jp/books/R000000004-I4469639

本文言語コード: ja

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