{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1390282679040282240.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.3131/jvsj.49.123"}},{"identifier":{"@type":"NDL_BIB_ID","@value":"7930658"}},{"identifier":{"@type":"URI","@value":"http://id.ndl.go.jp/bib/7930658"}},{"identifier":{"@type":"URI","@value":"https://ndlsearch.ndl.go.jp/books/R000000004-I7930658"}},{"identifier":{"@type":"NAID","@value":"10018133449"}}],"dc:title":[{"@language":"en","@value":"Analysis of O(1D) Distribution by Time-Resolved Measurement of Ozone Density for Application of UV-light Excited Ozone to Oxidation Process"},{"@language":"ja","@value":"オゾン濃度その場測定によるＵＶ光励起オゾン低温酸化プロセス中のＯ（｀１´Ｄ）の時間分布の解析"},{"@value":"オゾン濃度その場測定によるUV光励起オゾン低温酸化プロセス中のO(1D)の時間分布の解析"},{"@language":"ja-Kana","@value":"オゾン ノウド ソノバ ソクテイ ニ ヨル UVコウ レイキ オゾン テイオン サンカ プロセス チュウ ノ O 1D ノ ジカン ブンプ ノ カイセキ"}],"dc:language":"ja","description":[{"type":"abstract","notation":[{"@language":"en","@value":"Silicon oxidation process using UV-light excited ozone, i.e., ca. 100% ozone atmosphere irradiated by KrF excimer laser light (λ=248 nm), is one of the most promising techniques to fabricate a high-quality SiO<sub>2</sub> film at low temperatures. To clarify the mechanism of the silicon oxidation and to optimize the conditions of oxidation, we have done a time-resolved measurement of ozone density. The result shows that there are three stages of ozone density change. The calculated ozone density based on a reaction model fits the observed density at the first stage.<br>"}],"abstractLicenseFlag":"disallow"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1420001326207333760","@type":"Researcher","personIdentifier":[{"@type":"KAKEN_RESEARCHERS","@value":"20436166"},{"@type":"NRID","@value":"1000020436166"},{"@type":"NRID","@value":"9000003216334"},{"@type":"NRID","@value":"9000312840883"},{"@type":"NRID","@value":"9000363180629"},{"@type":"NRID","@value":"9000283195012"},{"@type":"NRID","@value":"9000025072098"},{"@type":"NRID","@value":"9000312840872"},{"@type":"NRID","@value":"9000376935688"},{"@type":"NRID","@value":"9000363180632"},{"@type":"NRID","@value":"9000322091420"},{"@type":"NRID","@value":"9000322092069"},{"@type":"NRID","@value":"9000312841520"},{"@type":"NRID","@value":"9000388524014"},{"@type":"NRID","@value":"9000401743109"},{"@type":"NRID","@value":"9000322092055"},{"@type":"NRID","@value":"9000239571673"},{"@type":"NRID","@value":"9000402474942"},{"@type":"RESEARCHMAP","@value":"https://researchmap.jp/read0087771"}],"foaf:name":[{"@language":"en","@value":"TOSAKA Aki"},{"@language":"ja","@value":"戸坂 亜希"}],"jpcoar:affiliationName":[{"@language":"en","@value":"National Institute of Advanced Industrial Science and Technology"},{"@language":"ja","@value":"独立行政法人産業技術総合研究所"}]},{"@id":"https://cir.nii.ac.jp/crid/1410001204064252673","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000000246907"}],"foaf:name":[{"@language":"en","@value":"NISHIGUCHI Tetsuya"},{"@language":"ja","@value":"西口 哲也"}],"jpcoar:affiliationName":[{"@language":"en","@value":"National Institute of Advanced Industrial Science and Technology"},{"@language":"ja","@value":"独立行政法人産業技術総合研究所"},{"@language":"ja","@value":"株式会社明電舎"},{"@language":"en","@value":"Meidensha Corporation"}]},{"@id":"https://cir.nii.ac.jp/crid/1410009222322071426","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000003435422"}],"foaf:name":[{"@language":"en","@value":"NONAKA Hidehiko"},{"@language":"ja","@value":"野中 秀彦"}],"jpcoar:affiliationName":[{"@language":"ja","@value":"独立行政法人産業技術総合研究所"},{"@language":"en","@value":"National Institute of Advanced Industrial Science and Technology"}]},{"@id":"https://cir.nii.ac.jp/crid/1410001204055725952","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000000460551"},{"@type":"NRID","@value":"9000003216312"},{"@type":"NRID","@value":"9000001790263"},{"@type":"NRID","@value":"9000283158597"},{"@type":"NRID","@value":"9000020151285"},{"@type":"NRID","@value":"9000253647880"},{"@type":"NRID","@value":"9000253325509"},{"@type":"NRID","@value":"9000401604167"},{"@type":"NRID","@value":"9000009389595"},{"@type":"NRID","@value":"9000062975476"},{"@type":"NRID","@value":"9000000007653"},{"@type":"NRID","@value":"9000001016010"},{"@type":"NRID","@value":"9000392701023"},{"@type":"NRID","@value":"9000392705870"},{"@type":"NRID","@value":"9000392737908"},{"@type":"NRID","@value":"9000252844974"},{"@type":"NRID","@value":"9000253326003"},{"@type":"NRID","@value":"9000401614947"},{"@type":"NRID","@value":"9000401645800"},{"@type":"NRID","@value":"9000401734505"},{"@type":"NRID","@value":"9000020125245"},{"@type":"NRID","@value":"9000347155496"},{"@type":"NRID","@value":"9000253649033"},{"@type":"NRID","@value":"9000401594144"},{"@type":"NRID","@value":"9000401646752"},{"@type":"NRID","@value":"9000401645148"},{"@type":"NRID","@value":"9000401804478"},{"@type":"NRID","@value":"9000401725923"},{"@type":"NRID","@value":"9000283627217"},{"@type":"NRID","@value":"9000047410744"},{"@type":"NRID","@value":"9000000951801"},{"@type":"NRID","@value":"9000020323140"},{"@type":"NRID","@value":"9000253491475"},{"@type":"NRID","@value":"9000283194196"},{"@type":"NRID","@value":"9000283117703"},{"@type":"NRID","@value":"9000392682395"},{"@type":"NRID","@value":"9000020060321"},{"@type":"NRID","@value":"9000253251491"},{"@type":"NRID","@value":"9000401645905"},{"@type":"NRID","@value":"9000401713445"},{"@type":"NRID","@value":"9000255900975"},{"@type":"NRID","@value":"9000258177752"},{"@type":"NRID","@value":"9000009841355"},{"@type":"NRID","@value":"9000001728316"},{"@type":"NRID","@value":"9000392722753"},{"@type":"NRID","@value":"9000021459142"},{"@type":"NRID","@value":"9000253647732"},{"@type":"NRID","@value":"9000410317018"},{"@type":"NRID","@value":"9000283624117"},{"@type":"NRID","@value":"9000283195015"},{"@type":"NRID","@value":"9000262371179"},{"@type":"NRID","@value":"9000020301710"},{"@type":"NRID","@value":"9000253700105"},{"@type":"NRID","@value":"9000253326996"},{"@type":"NRID","@value":"9000240071895"},{"@type":"NRID","@value":"9000402005340"},{"@type":"NRID","@value":"9000401618556"},{"@type":"NRID","@value":"9000406047742"},{"@type":"NRID","@value":"9000048726824"},{"@type":"NRID","@value":"9000392697069"},{"@type":"NRID","@value":"9000020097768"},{"@type":"NRID","@value":"9000253647950"},{"@type":"NRID","@value":"9000401618916"},{"@type":"NRID","@value":"9000392738286"},{"@type":"NRID","@value":"9000392729022"},{"@type":"NRID","@value":"9000258120536"},{"@type":"NRID","@value":"9000253648927"},{"@type":"NRID","@value":"9000401653747"},{"@type":"NRID","@value":"9000258206608"},{"@type":"NRID","@value":"9000016609368"},{"@type":"NRID","@value":"9000392730963"},{"@type":"NRID","@value":"9000283847994"},{"@type":"NRID","@value":"9000401699217"},{"@type":"NRID","@value":"9000401772869"},{"@type":"NRID","@value":"9000020279076"},{"@type":"NRID","@value":"9000020150089"},{"@type":"NRID","@value":"9000242087869"},{"@type":"NRID","@value":"9000401650846"},{"@type":"NRID","@value":"9000402057141"},{"@type":"NRID","@value":"9000258157903"},{"@type":"NRID","@value":"9000018351399"},{"@type":"NRID","@value":"9000000098671"},{"@type":"NRID","@value":"9000392686355"},{"@type":"NRID","@value":"9000005569574"},{"@type":"NRID","@value":"9000258149426"},{"@type":"NRID","@value":"9000053054549"},{"@type":"NRID","@value":"9000252845339"},{"@type":"NRID","@value":"9000401582474"},{"@type":"NRID","@value":"9000401610467"},{"@type":"NRID","@value":"9000401638153"},{"@type":"NRID","@value":"9000401756628"},{"@type":"NRID","@value":"9000401743112"},{"@type":"NRID","@value":"9000283627236"},{"@type":"NRID","@value":"9000258169754"},{"@type":"NRID","@value":"9000107352895"},{"@type":"NRID","@value":"9000392699164"},{"@type":"NRID","@value":"9000401766454"},{"@type":"NRID","@value":"9000401704324"},{"@type":"NRID","@value":"9000257982649"},{"@type":"NRID","@value":"9000009426156"},{"@type":"NRID","@value":"9000283157949"},{"@type":"NRID","@value":"9000020100501"},{"@type":"NRID","@value":"9000401693955"},{"@type":"NRID","@value":"9000401605402"},{"@type":"NRID","@value":"9000401637817"},{"@type":"NRID","@value":"9000283627274"},{"@type":"NRID","@value":"9000258157120"},{"@type":"NRID","@value":"9000256367071"},{"@type":"NRID","@value":"9000075725388"},{"@type":"NRID","@value":"9000107352569"},{"@type":"NRID","@value":"9000392738402"},{"@type":"NRID","@value":"9000021614462"},{"@type":"NRID","@value":"9000401620784"},{"@type":"NRID","@value":"9000392694941"},{"@type":"NRID","@value":"9000256657196"},{"@type":"RESEARCHMAP","@value":"https://researchmap.jp/read0121036"}],"foaf:name":[{"@language":"en","@value":"ICHIMURA Shingo"},{"@language":"ja","@value":"一村 信吾"}],"jpcoar:affiliationName":[{"@language":"en","@value":"National Institute of Advanced Industrial Science and Technology"},{"@language":"ja","@value":"独立行政法人産業技術総合研究所"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"05598516"},{"@type":"EISSN","@value":"18809413"},{"@type":"NDL_BIB_ID","@value":"000000011964"},{"@type":"ISSN","@value":"05598516"},{"@type":"LISSN","@value":"05598516"},{"@type":"NCID","@value":"AN00119871"}],"prism:publicationName":[{"@language":"ja","@value":"真空"},{"@language":"en","@value":"Shinku"},{"@language":"en","@value":"J. Vac. Soc. Jpn."},{"@language":"en","@value":"Journal of the Vacuum Society of Japan"},{"@language":"ja","@value":"真空"},{"@language":"en","@value":"SHINKU"}],"dc:publisher":[{"@language":"en","@value":"The Vacuum Society of Japan"},{"@language":"ja","@value":"一般社団法人 日本真空学会"}],"prism:publicationDate":"2006","prism:volume":"49","prism:number":"3","prism:startingPage":"123","prism:endingPage":"125"},"reviewed":"false","url":[{"@id":"http://id.ndl.go.jp/bib/7930658"},{"@id":"https://ndlsearch.ndl.go.jp/books/R000000004-I7930658"}],"availableAt":"2006","foaf:topic":[{"@id":"https://cir.nii.ac.jp/all?q=Electrical%20and%20Electronic%20Engineering","dc:title":"Electrical and Electronic Engineering"},{"@id":"https://cir.nii.ac.jp/all?q=Surfaces,%20Coatings%20and%20Films","dc:title":"Surfaces, Coatings and Films"},{"@id":"https://cir.nii.ac.jp/all?q=Condensed%20Matter%20Physics","dc:title":"Condensed Matter Physics"}],"relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1361137045805806720","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Photodissociation of O3 in the Hartley Band. Reactions of O(1D) and O2(1Σg+) with O3 and O2"}]},{"@id":"https://cir.nii.ac.jp/crid/1361981468952035840","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Estimating the Peak Intesity and Energy Content of Short Duration Pulses Using Saturable Absorbers"}]},{"@id":"https://cir.nii.ac.jp/crid/1362825893684075776","@type":"Article","relationType":["references","cites"],"jpcoar:relatedTitle":[{"@value":"High-quality SiO2 film formation by highly concentrated ozone gas at below 600 °C"}]},{"@id":"https://cir.nii.ac.jp/crid/1363107370142190208","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process"}]},{"@id":"https://cir.nii.ac.jp/crid/1363107370306451456","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Ozone photochemistry: production and deactivation of O(21D2) following photolysis at 248 nm"}]},{"@id":"https://cir.nii.ac.jp/crid/1363951793861544960","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Evaluated Kinetic and Photochemical Data for Atmospheric Chemistry: Supplement I CODATA Task Group on Chemical Kinetics"}]},{"@id":"https://cir.nii.ac.jp/crid/1364233270112318464","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@value":"Nonlinear Absorbers of Light"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001204064280448","@type":"Article","relationType":["references"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Ultra-low Temperature Oxidation of Silicon using UV Light-exited Ozone in Wafer-transfer Type Chamber"},{"@language":"ja","@value":"オゾン光解離励起状態酸素原子によるシリコン低温酸化"},{"@language":"ja-Kana","@value":"オゾン ヒカリ カイリレイキジョウタイ サンソ ゲンシ ニ ヨル シリコン テイオン サンカ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001204067358464","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Oxidation on Poly Silicon at Low Temperature Using UV Light-excited Ozone Gas"},{"@language":"ja","@value":"ＵＶ光励起オゾンを用いたポリシリコンの低温酸化"},{"@language":"ja-Kana","@value":"UV ヒカリ レイキ オゾン オ モチイタ ポリ シリコン ノ テイオン サンカ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205295476480","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Evaluation of Surface Oxidation Behavior on Silver Film for Active Oxygen Detector"},{"@language":"ja","@value":"活性酸素検出用銀薄膜の表面酸化挙動の評価"},{"@language":"ja-Kana","@value":"カッセイ サンソ ケンシュツヨウギン ハクマク ノ ヒョウメン サンカ キョドウ ノ ヒョウカ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205295554048","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"ja","@value":"励起状酸素を用いたシリコン低温酸化の大型基板酸化への適用"},{"@language":"en","@value":"Application of UV-Light Excited Ozone to Large-Sized Si Wafer at Low Temperature"},{"@language":"ja-Kana","@value":"レイキジョウ サンソ オ モチイタ シリコン テイオン サンカ ノ オオガタ キバン サンカ エノ テキヨウ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205295555712","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"ja","@value":"１，１，１，３，３，３‐ヘキサメチルジシラザン（ＨＭＤＳ）とオゾンによるシリコン酸化膜成長：赤外吸収スペクトルによる解析"},{"@language":"en","@value":"Fabrication of a Silicon Oxide Film by Ozone and 1,1,1,3,3,3-Hexamethyldisilazane (HMDS): Infrared Absorption Analysis on a Photochemical Reaction in the Gas Phase"},{"@value":"1,1,1,3,3,3-ヘキサメチルジシラザン(HMDS)とオゾンによるシリコン酸化膜成長--赤外吸収スペクトルによる解析"},{"@language":"ja-Kana","@value":"1 1 1 3 3 3 ヘキサメチルジシラザン HMDS ト オゾン ニ ヨル シリコン サンカ マク セイチョウ セキガイ キュウシュウ スペクトル ニ ヨル カイセキ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206263581312","@type":"Article","relationType":["references","cites"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Low-Temperature Oxidation of Silicon using UV-Light-Excited Ozone"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282680272911360","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Ozone Killer by UV-Light Irradiation for Reduced Pressure and High Concentration Ozone Gas"},{"@language":"ja","@value":"紫外光分解反応を用いた減圧・高濃度オゾンガス分解装置"},{"@language":"ja-Kana","@value":"シガイコウ ブンカイ ハンノウ オ モチイタ ゲンアツ コウノウド オゾンガス ブンカイ ソウチ"}]},{"@id":"https://cir.nii.ac.jp/crid/1570291225406582912","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1570572700383294336","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1570854175360003968","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1572261550243559168","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1573105975173691264","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1573105976303281152","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1573387450150402816","@type":"Article","relationType":["cites"]},{"@id":"https://cir.nii.ac.jp/crid/1574231875080537216","@type":"Article","relationType":["cites"]}],"dataSourceIdentifier":[{"@type":"JALC","@value":"oai:japanlinkcenter.org:0027762732"},{"@type":"NDL_SEARCH","@value":"oai:ndlsearch.ndl.go.jp:R000000004-I7930658"},{"@type":"CROSSREF","@value":"10.3131/jvsj.49.123"},{"@type":"CIA","@value":"10018133449"},{"@type":"CROSSREF","@value":"10.3131/jvsj2.52.245_references_DOI_Q2t1Qulf2a4VfRvaSvJ0EiBfSAq"},{"@type":"CROSSREF","@value":"10.3131/jvsj2.51.228_references_DOI_Q2t1Qulf2a4VfRvaSvJ0EiBfSAq"},{"@type":"CROSSREF","@value":"10.3131/jvsj.50.208_references_DOI_Q2t1Qulf2a4VfRvaSvJ0EiBfSAq"},{"@type":"CROSSREF","@value":"10.3131/jvsj2.51.224_references_DOI_Q2t1Qulf2a4VfRvaSvJ0EiBfSAq"},{"@type":"CROSSREF","@value":"10.3131/jvsj2.53.206_references_DOI_Q2t1Qulf2a4VfRvaSvJ0EiBfSAq"}]}