Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
SHINOZAKI Fumiaki and SATO Morimasa,A Study of Application of Dry-filmed Photoresist to Micro-lithography.,Journal of Printing Science and Technology,0914-3319,The Japanese Society of Printing Science and Technology,1995,32,5,298-302,https://cir.nii.ac.jp/crid/1390282679066445568,https://doi.org/10.11413/nig1987.32.298