Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
KOJIMA Hiroyasu and SAITO Nagahiro and TAKAI Osamu,High-Rate Reactive Deposition of SiO<sub>2</sub> Films Using a New DC Rotary Sputtering Cathode,Journal of The Surface Finishing Society of Japan,09151869,The Surface Finishing Society of Japan,2012,63,3,179,https://cir.nii.ac.jp/crid/1390282679095458944,https://doi.org/10.4139/sfj.63.179