著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Houlihan Francis and Dioses Alberto and Toukhy Medhat and Romano Andrew and Oberlander Joseph and Wu HengPeng and Mullen Salem and Krawicz Alexandra and Lu PingHung and Neisser Mark,Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2007,20,3,359-364,https://cir.nii.ac.jp/crid/1390282679300475520,https://doi.org/10.2494/photopolymer.20.359