Techniques for Measuring Rate Constants for Acid Generation from PAG (Photo Acid Generator) during ArF Exposure

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We previously performed in situ FT-IR measurements while subjecting chemically-amplified resists to UV light (248 nm) to observe photodecomposition of the PAG for KrF excimer lasers. Based on these observations, we measured rate constants for acid generation associated with PAG photodecomposition. More recently, we equipped our FT-IR system with a 193-nm excimer lamp (developed by Ushio Inc.) to perform the world's first in situ observations of PAG photodecomposition using 193-nm light. Our report also describes the successful measurement of rate constants for acid generation from the PAG for ArF excimer lasers.

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