著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nagata Shohei and Niihara Shota and Harada Tetsuo and Watanabe Takeo,Resist Investigation Method using ab initio MO Calculation on basis of Approximation Molecular Model,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2017,30,5,583-589,https://cir.nii.ac.jp/crid/1390282679300639232,https://doi.org/10.2494/photopolymer.30.583