著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Murphy Michael and Narasimhan Amrit and Grzeskowiak Steven and Sitterly Jacob and Schuler Philip and Richards Jeff and Denbeaux Greg and Brainard Robert L.,EUV Mechanistic Studies of Antimony Resists,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2017,30,1,121-131,https://cir.nii.ac.jp/crid/1390282679300891136,https://doi.org/10.2494/photopolymer.30.121