著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kawai Akira and Abe Takato,Direct Measurement of Resist Pattern Adhesion on the Surface with Silane-coupling Treatment by Atomic Force Microscope(AFM.),Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2001,14,4,513-518,https://cir.nii.ac.jp/crid/1390282679301436928,https://doi.org/10.2494/photopolymer.14.513