Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Kumada Teruhiko and Sumitani Hiroaki and Matsui Yasuji,Suppression of Pattern Edge Roughness by Low Ion Strength Developer.,Journal of Photopolymer Science and Technology,09149244,The Society of Photopolymer Science and Technology(SPST),2001,14,4,519-522,https://cir.nii.ac.jp/crid/1390282679301437824,https://doi.org/10.2494/photopolymer.14.519