著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nishimura Yukio and Michelson Timothy and Meiring Jason E. and Stewart Michael D. and Wilson C. Grant,"Line Edge Roughness in Chemically Amplified Resist: Speculation, Simulation and Application",Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,4,457-465,https://cir.nii.ac.jp/crid/1390282679301568000,https://doi.org/10.2494/photopolymer.18.457