著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kozawa Takahiro and Tagawa Seiichi,Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,4,471-474,https://cir.nii.ac.jp/crid/1390282679301570304,https://doi.org/10.2494/photopolymer.18.471