著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nakano Kaichiro and Iwasa Shigeyuki and Maeda Katsumi and Hasegawa Etsuo,Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists.,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2001,14,3,357-362,https://cir.nii.ac.jp/crid/1390282679301660928,https://doi.org/10.2494/photopolymer.14.357