Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Hosaka Yuji and Oyama Tomoko Gowa and Oshima Akihiro and Enomoto Satoshi and Washio Masakazu and Tagawa Seiichi,Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A,Journal of Photopolymer Science and Technology,09149244,The Society of Photopolymer Science and Technology(SPST),2013,26,6,745-750,https://cir.nii.ac.jp/crid/1390282679301778304,https://doi.org/10.2494/photopolymer.26.745