著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Matsuzawa Nobuyuki and Watanabe Yoko and Thuunakart Boontarika and Ozawa Ken and Yamaguchi Yuko and Ikeda Rikio and Kawahira Hiroichi,Numerical Investigations on Requirements for BARK Materials for Hyper NA Immersion Lithography,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,5,587-592,https://cir.nii.ac.jp/crid/1390282679301909120,https://doi.org/10.2494/photopolymer.18.587