著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Young Gun and Wu Wei. and Lee Heon and Wang S. Y. and Tong William M. and Williams R. Stanley,Fabrication of Multi-bit Crossbar Circuits at Sub-50 nm Half-pitch by Using UV-based Nanoimprint Lithography,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,5,565-570,https://cir.nii.ac.jp/crid/1390282679301911424,https://doi.org/10.2494/photopolymer.18.565