著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Padmanaban Murirathna and Kudo Takamori and Lin Guanyang and Hong Sungeun and Nishibe Takeshi and Takano Yusuke,Contact Hole Resist Solutions for 45-90nm Node Design Rules,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2004,17,4,489-496,https://cir.nii.ac.jp/crid/1390282679302107136,https://doi.org/10.2494/photopolymer.17.489